Issued Patents 2019
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10520813 | Extreme ultraviolet photoresist with high-efficiency electron transfer | Chin-Hsiang Lin, Chien-Wei Wang | 2019-12-31 |
| 10520820 | Negative tone developer for extreme ultraviolet lithography | Chen-Yu Liu, Tzu-Yang Lin, Ming-Hui Weng, Ching-Yu Chang, Chin-Hsiang Lin | 2019-12-31 |
| 10514603 | Photoresist and method | Ching-Yu Chang, Chen-Hau Wu | 2019-12-24 |
| 10401728 | Extreme ultraviolet photoresist and method | Yen-Hao Chen, Chien-Wei Wang, Chin-Hsiang Lin | 2019-09-03 |
| 10365561 | Photoresist and method | Ching-Yu Chang, Chen-Hau Wu | 2019-07-30 |
| 10312108 | Method for forming semiconductor structure using modified resist layer | Li-Po YANG, Chien-Wei Wang, Chin-Hsiang Lin | 2019-06-04 |