Issued Patents 2019
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10520813 | Extreme ultraviolet photoresist with high-efficiency electron transfer | Wei-Han Lai, Chin-Hsiang Lin | 2019-12-31 |
| 10515812 | Methods of reducing pattern roughness in semiconductor fabrication | Joy Cheng, Ching-Yu Chang, Chin-Hsiang Lin | 2019-12-24 |
| 10503070 | Photosensitive material and method of lithography | An-Ren Zi, Ching-Yu Chang | 2019-12-10 |
| 10487184 | Continuous process for preparing a polyester shrinkable film | Ching-Chun Tsai, Tsung-Hung Liu, Tsan-Chin Chang, Chi-Feng Lin, Jie Shiu +1 more | 2019-11-26 |
| 10468249 | Patterning process of a semiconductor structure with a middle layer | Chien-Chih Chen | 2019-11-05 |
| 10401728 | Extreme ultraviolet photoresist and method | Yen-Hao Chen, Wei-Han Lai, Chin-Hsiang Lin | 2019-09-03 |
| 10394126 | Photolithography process and materials | Ya-Ling Cheng, Ching-Yu Chang, Yen-Hao Chen | 2019-08-27 |
| 10312108 | Method for forming semiconductor structure using modified resist layer | Li-Po YANG, Wei-Han Lai, Chin-Hsiang Lin | 2019-06-04 |