Issued Patents 2019
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10503070 | Photosensitive material and method of lithography | Ching-Yu Chang, Chien-Wei Wang | 2019-12-10 |
| 10466593 | Method and apparatus of patterning a semiconductor device | Ching-Yu Chang | 2019-11-05 |
| 10381481 | Multi-layer photoresist | Ching-Yu Chang, Chin-Hsiang Lin | 2019-08-13 |
| 10274847 | Humidity control in EUV lithography | Chin-Hsiang Lin, Ching-Yu Chang, Joy Cheng | 2019-04-30 |