Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10366973 | Layout modification method for exposure manufacturing process | Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2019-07-30 |
| 10276375 | Assistant pattern for measuring critical dimension of main pattern in semiconductor manufacturing | Wen-Chen Lu, Chaos Tsai, Feng-Jia Shiu | 2019-04-30 |