Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10488766 | Lithography system having invisible pellicle over mask | Chiu-Hsiang Chen, Shih-Ming Chang, Chih-Jie Lee, Yung-Sung Yen, Ru-Gun Liu | 2019-11-26 |
| 10276392 | Loading effect reduction through multiple coat-etch processes | Jin-Dah Chen, Ming-Feng Shieh, Yu-Hsien Lin, Po-Chun Liu, Stan Chen | 2019-04-30 |