Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10457761 | Polymer, resist composition, and pattern forming process | Jun Hatakeyama, Teppei Adachi | 2019-10-29 |
| 10203601 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Katsuya Takemura, Masashi Iio, Koji Hasegawa | 2019-02-12 |
| 10191373 | Method for producing polymer | Jun Hatakeyama, Teppei Adachi | 2019-01-29 |