Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10495969 | Chemically amplified positive resist composition and resist pattern forming process | Masaaki Kotake, Satoshi Watanabe, Masaki Ohashi | 2019-12-03 |
| 10416558 | Positive resist composition, resist pattern forming process, and photomask blank | Satoshi Watanabe, Masaaki Kotake, Masaki Ohashi | 2019-09-17 |
| 10345700 | Negative-tone resist compositions and multifunctional polymers therein | Luisa D. Bozano, Daisuke Domon, Yoshio Kawai, Martha I. Sanchez, Daniel P. Sanders +3 more | 2019-07-09 |