Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10495969 | Chemically amplified positive resist composition and resist pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Masaki Ohashi | 2019-12-03 |
| 10416558 | Positive resist composition, resist pattern forming process, and photomask blank | Keiichi Masunaga, Satoshi Watanabe, Masaki Ohashi | 2019-09-17 |