Issued Patents 2019
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10364314 | Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method | Kana OKADA, Junya HORIUCHI, Masatoshi Echigo | 2019-07-30 |
| 10359701 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Kana OKADA, Masatoshi Echigo, Go Higashihara, Atsushi Okoshi | 2019-07-23 |
| 10338471 | Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Kana OKADA, Masatoshi Echigo, Go Higashihara, Atsushi Okoshi | 2019-07-02 |
| 10310377 | Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method | Masatoshi Echigo | 2019-06-04 |
| 10294183 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin | Masatoshi Echigo | 2019-05-21 |