Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10364314 | Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method | Junya HORIUCHI, Takashi MAKINOSHIMA, Masatoshi Echigo | 2019-07-30 |
| 10359701 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Takashi MAKINOSHIMA, Masatoshi Echigo, Go Higashihara, Atsushi Okoshi | 2019-07-23 |
| 10338471 | Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Takashi MAKINOSHIMA, Masatoshi Echigo, Go Higashihara, Atsushi Okoshi | 2019-07-02 |