Issued Patents 2019
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10437148 | Resist material, resist composition and method for forming resist pattern | Takumi TOIDA, Takashi Sato | 2019-10-08 |
| 10377734 | Resist composition, method for forming resist pattern, polyphenol derivative for use in the composition | Masako Yamakawa | 2019-08-13 |
| 10364314 | Compound, resin, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography, resist pattern forming method, circuit pattern forming method, and purification method | Kana OKADA, Junya HORIUCHI, Takashi MAKINOSHIMA | 2019-07-30 |
| 10359701 | Material for forming underlayer film for lithography, composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Kana OKADA, Takashi MAKINOSHIMA, Go Higashihara, Atsushi Okoshi | 2019-07-23 |
| 10338471 | Composition for forming underlayer film for lithography, underlayer film for lithography and pattern forming method | Kana OKADA, Takashi MAKINOSHIMA, Go Higashihara, Atsushi Okoshi | 2019-07-02 |
| 10310377 | Material for forming film for lithography, composition for forming film for lithography, film for lithography, pattern forming method and purification method | Takashi MAKINOSHIMA | 2019-06-04 |
| 10303055 | Resist composition and method for forming resist pattern | Takashi Sato | 2019-05-28 |
| 10294183 | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin | Takashi MAKINOSHIMA | 2019-05-21 |