Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10204796 | Methods for selective etching of a silicon material using HF gas without nitrogen etchants | Nitin K. Ingle, Anchuan Wang, Zihui Li | 2019-02-12 |
| 10177227 | Method for fabricating junctions and spacers for horizontal gate all around devices | Naomi Yoshida, Lin Dong, Shiyu Sun, Myungsun Kim, Nam Sung Kim +3 more | 2019-01-08 |