Issued Patents 2019
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10325004 | Method of optimizing an optical parametric model for structural analysis using optical critical dimension (OCD) metrology | Thaddeus Gerard Dziura, Yung-Ho Alex Chuang, Xuefeng Liu, John J. Hench | 2019-06-18 |