Issued Patents 2019
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10444627 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | Hiroo Takizawa, Toru Fujimori, Wataru Nihashi, Shuji Hirano | 2019-10-15 |
| 10324374 | Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, mask blank provided with active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, electronic device and novel compound | Shuhei Yamaguchi, Tomotaka Tsuchimura, Koutarou Takahashi | 2019-06-18 |