Issued Patents 2019
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10444627 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | Hiroo Takizawa, Wataru Nihashi, Shuji Hirano, Natsumi Yokokawa | 2019-10-15 |