Issued Patents 2019
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10475658 | Formulations to selectively etch silicon and germanium | Steven M. Bilodeau | 2019-11-12 |
| 10472567 | Compositions and methods for selectively etching titanium nitride | Li-Min Chen, Steven Lippy, Lingyan Song, Chia-Jung Hsu, Sheng-Hung Tu +1 more | 2019-11-12 |
| 10460954 | Anti-reflective coating cleaning and post-etch residue removal composition having metal, dielectric and nitride compatibility | Steven Lippy, Lingyan Song | 2019-10-29 |
| 10446389 | Formulations for the removal of particles generated by cerium-containing solutions | Jeffery A. Barnes | 2019-10-15 |
| 10428271 | Compositions and methods for selectively etching titanium nitride | Li-Min Chen, Steven Lippy, Chia-Jung Hsu, Sheng-Hung Tu, Chieh-Ju Wang | 2019-10-01 |
| 10392560 | Compositions and methods for selectively etching titanium nitride | Jeffrey A. Barnes, Li-Min Chen, Steven Lippy, Rekha Rajaram, Sheng-Hung Tu | 2019-08-27 |
| 10347504 | Use of non-oxidizing strong acids for the removal of ion-implanted resist | Steven M. Bilodeau, Jaeseok Lee, WonLae Kim, Jeffrey A. Barnes | 2019-07-09 |
| 10340150 | Ni:NiGe:Ge selective etch formulations and method of using same | Steven M. Bilodeau, Jeffrey A. Barnes, Hsing-Chen Wu, Sheng-Hung Tu, Thomas Parson +1 more | 2019-07-02 |
| 10290505 | Passivation of germanium surfaces | Steven M. Bilodeau, Hsing-Chen Wu, Min-Chieh Yang | 2019-05-14 |
| 10176979 | Post-CMP removal using compositions and method of use | Jun Liu, Jeffrey A. Barnes, Laisheng Sun, Elizabeth THOMAS, Jason Y.H. Chang | 2019-01-08 |