JN

Jan Okke Nieuwenkamp

AB Asml Netherlands B.V.: 2 patents #155 of 721Top 25%
📍 Enschede, NL: #1 of 58 inventorsTop 2%
Overall (2019): #162,362 of 560,194Top 30%
2
Patents 2019

Issued Patents 2019

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10481498 Droplet generator for lithographic apparatus, EUV source and lithographic apparatus Johan Frederik Dijksman, Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Koen Gerhardus Winkels, Theodorus Wilhelmus Driessen, Georgiy O. Vaschenko +4 more 2019-11-19
10394141 Radiation source and lithographic apparatus Michel Riepen, Dzmitry Labetski, Wilbert Jan Mestrom, Wim Ronald Kampinga, Jacob Brinkert +12 more 2019-08-27