Issued Patents 2019
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10410845 | Using bias RF pulsing to effectively clean electrostatic chuck (ESC) | Kenny L. Doan, Wonseok Lee, Daisuke Shimizu, Li Ling, Kevin Choi | 2019-09-10 |
UD
Usama Dadu
Overall (2019): #233,374 of 560,194Top 45%
1
Patents 2019