Issued Patents 2019
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10493590 | Selection of polishing parameters to generate removal or pressure profile | Garrett H. Sin, King Yi Heung, Nathan Bohannon, Qing Zhang | 2019-12-03 |
| 10322492 | Retaining ring for CMP | Andrew J. Nagengast, Christopher Heung-Gyun Lee, Thomas Li, Anand N. Iyer, Jie Diao +3 more | 2019-06-18 |
| 10252397 | Methods and apparatus for profile and surface preparation of retaining rings utilized in chemical mechanical polishing processes | David Masayuki Ishikawa, Jeonghoon Oh, Garrett H. Sin, Charles C. Garretson, Chia-Ling PAI +2 more | 2019-04-09 |