| 10103034 |
Method of planarizing substrate surface |
Li-Chieh Hsu, Fu-Shou Tsai, Yu-Ting Li, Yi-Liang Liu |
2018-10-16 |
| 10049887 |
Method of planarizing substrate surface |
Li-Chieh Hsu, Fu-Shou Tsai, Yu-Ting Li, Yi-Liang Liu |
2018-08-14 |
| 10008581 |
Semiconductor device having metal gate with nitrogen rich portion and titanium rich portion |
Chun-Tsen Lu, Chien-Ming Lai, Lu-Sheng Chou, Ya-Huei Tsai, Ching-Hsiang Chiu +3 more |
2018-06-26 |
| 9972498 |
Method of fabricating a gate cap layer |
Fu-Shou Tsai, Yu-Ting Li, Chih-Hsun Lin, Li-Chieh Hsu, Yi-Liang Liu +2 more |
2018-05-15 |
| 9966263 |
Method of fabricating fin structure |
Li-Chieh Hsu, Yi-Han Liao, Chun-Tsen Lu, Chih-Hsun Lin, Hsin-Jung Liu |
2018-05-08 |
| 9905430 |
Method for forming semiconductor structure |
Fu-Shou Tsai, Yu-Ting Li, Li-Chieh Hsu, Yi-Liang Liu, Po-Cheng Huang +1 more |
2018-02-27 |
| 9887158 |
Conductive structure having an entrenched high resistive layer |
Kuo-Chin Hung, Min-Chuan Tsai, Wei-Chuan Tsai, Yi-Han Liao, Chun-Tsen Lu +2 more |
2018-02-06 |
| 9875909 |
Method for planarizing material layer |
Fu-Shou Tsai, Yu-Ting Li, Li-Chieh Hsu, Yi-Liang Liu, Po-Cheng Huang +1 more |
2018-01-23 |