Issued Patents 2018
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10072237 | Photoresist cleaning composition used in photolithography and a method for treating substrate therewith | Randy Li-Kai Chang, Gene Everad Parris, Hsiu-Mei Chen, Wen Dar Liu, Tianniu Chen +3 more | 2018-09-11 |
| 10073351 | Semi-aqueous photoresist or semiconductor manufacturing residue stripping and cleaning composition with improved silicon passivation | Rajiv Krishan Agarwal, Mark Richard Brown, Aiping Wu, David Barry Rennie, Gene Everad Parris | 2018-09-11 |
| 9976111 | TiN hard mask and etch residual removal | Wen Dar Liu, William Jack Casteel, Jr., Tianniu Chen, Rajiv Krishan Agarwal, Madhukar Bhaskara Rao | 2018-05-22 |
| 9957469 | Copper corrosion inhibition system | Wen Dar Liu, Seiji Inaoka, Agnes Derecskei-Kovacs | 2018-05-01 |