Issued Patents 2018
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10072237 | Photoresist cleaning composition used in photolithography and a method for treating substrate therewith | Randy Li-Kai Chang, Gene Everad Parris, Hsiu-Mei Chen, Yi-Chia Lee, Tianniu Chen +3 more | 2018-09-11 |
| 9976111 | TiN hard mask and etch residual removal | Yi-Chia Lee, William Jack Casteel, Jr., Tianniu Chen, Rajiv Krishan Agarwal, Madhukar Bhaskara Rao | 2018-05-22 |
| 9957469 | Copper corrosion inhibition system | Seiji Inaoka, Yi-Chia Lee, Agnes Derecskei-Kovacs | 2018-05-01 |