| 10103234 |
Fabricating raised source drain contacts of a CMOS structure |
Lukas Czornomaz, Vladimir Djara |
2018-10-16 |
| 10037800 |
Resistive memory apparatus using variable-resistance channels with high- and low-resistance regions |
Lukas Czornomaz, Vara Sudananda Prasad Jonnalagadda, Wabe W. Koelmans, Abu Sebastian |
2018-07-31 |
| 9997409 |
Fabricating contacts of a CMOS structure |
Lukas Czornomaz, Vladimir Djara, Pouya Hashemi |
2018-06-12 |
| 9984929 |
Fabricating contacts of a CMOS structure |
Lukas Czornomaz, Vladimir Djara, Pouya Hashemi |
2018-05-29 |
| 9977325 |
Modifying design layer of integrated circuit (IC) |
Howard S. Landis, Arun Sankar Mampazhy, Neelima Mandloi |
2018-05-22 |
| 9953125 |
Design/technology co-optimization platform for high-mobility channels CMOS technology |
Daniele Caimi, Lukas Czornomaz, Vladimir Djara, Jean Fompeyrine |
2018-04-24 |
| 9923022 |
Array of optoelectronic structures and fabrication thereof |
Mattias B. Borg, Lukas Czornomaz, Vladimir Djara, Heike E. Riel, Heinz Schmid |
2018-03-20 |
| 9917164 |
Fabricating raised source drain contacts of a CMOS structure |
Lukas Czornomaz, Vladimir Djara |
2018-03-13 |
| 9881921 |
Fabricating a dual gate stack of a CMOS structure |
Lukas Czornomaz, Vladimir Djara, Jean Fompeyrine |
2018-01-30 |
