Issued Patents 2018
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10141188 | Resist having tuned interface hardmask layer for EUV exposure | Michael P. Belyansky, Ravi K. Bonam, Anuja E. DeSilva | 2018-11-27 |
| 10134592 | Resist having tuned interface hardmask layer for EUV exposure | Michael P. Belyansky, Ravi K. Bonam, Anuja E. DeSilva | 2018-11-20 |
| 9928316 | Process-metrology reproducibility bands for lithographic photomasks | Todd C. Bailey, Ioana Graur, Marshal A. Miller | 2018-03-27 |
| 9929012 | Resist having tuned interface hardmask layer for EUV exposure | Michael P. Belyansky, Ravi K. Bonam, Anuja E. DeSilva | 2018-03-27 |