Issued Patents 2018
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10115725 | Structure and method for hard mask removal on an SOI substrate without using CMP process | — | 2018-10-30 |
| 10008421 | Capacitance monitoring using x-ray diffraction | Donghun Kang, Kriteshwar K. Kohli, Anita Madan, Conal E. Murray | 2018-06-26 |
| 9870960 | Capacitance monitoring using X-ray diffraction | Donghun Kang, Kriteshwar K. Kohli, Anita Madan, Conal E. Murray | 2018-01-16 |