Issued Patents 2018
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10054860 | Projection exposure apparatus with optimized adjustment possibility | Boris Bittner, Holger Walter | 2018-08-21 |
| 10001631 | Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element | Boris Bittner, Norbert Wabra, Sonja Schneider, Ricarda Schoemer, Hendrik Wagner +6 more | 2018-06-19 |