HW

Holger Walter

CG Carl Zeiss Smt Gmbh: 2 patents #47 of 287Top 20%
AB Asml Netherlands B.V.: 1 patents #194 of 559Top 35%
Overall (2018): #143,304 of 503,207Top 30%
2
Patents 2018

Issued Patents 2018

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10054860 Projection exposure apparatus with optimized adjustment possibility Boris Bittner, Matthias Roesch 2018-08-21
10031423 EUV exposure apparatus with reflective elements having reduced influence of temperature variation Norman Baer, Ulrich Loering, Oliver Natt, Gero Wittich, Timo Laufer +7 more 2018-07-24