Issued Patents 2017
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9810994 | Systems and methods for high-throughput and small-footprint scanning exposure for lithography | Burn Jeng Lin, Jaw-Jung Shin, Wen-Chuan Wang | 2017-11-07 |
| 9761411 | System and method for maskless direct write lithography | Cheng-Chi Wu, Jensen Yang, Wen-Chuan Wang | 2017-09-12 |
| 9734883 | Reference circuit and MRAM | Chwen Yu, William J. Gallagher | 2017-08-15 |
| 9678434 | Grid refinement method | Wen-Chuan Wang, Burn Jeng Lin, Jaw-Jung Shin, Pei-Yi Liu | 2017-06-13 |
| 9658538 | System and technique for rasterizing circuit layout data | Pei-Yi Liu, Cheng-Chi Wu, Cheng-Hung Chen, Jyuh-Fuh Lin, Wen-Chuan Wang | 2017-05-23 |
| 9594862 | Method of fabricating an integrated circuit with non-printable dummy features | Jyuh-Fuh Lin, Cheng-Hung Chen, Pei-Yi Liu, Wen-Chuan Wang, Burn Jeng Lin | 2017-03-14 |
| 9589764 | Electron beam lithography process with multiple columns | Wen-Chuan Wang | 2017-03-07 |
| 9552964 | Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity | Jyuh-Fuh Lin, Cheng-Hung Chen, Pei-Yi Liu, Wen-Chuan Wang, Burn Jeng Lin | 2017-01-24 |