Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9805943 | Polymer for resist under layer film composition, resist under layer film composition, and patterning process | Rie Kikuchi, Seiichiro Tachibana, Tsutomu Ogihara | 2017-10-31 |
| 9708350 | Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator | Yuki Suka, Yuji Harada, Shiori Nonaka | 2017-07-18 |