Issued Patents 2017
Showing 1–3 of 3 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9817311 | Resist pattern-forming method, substrate-processing method, and photoresist composition | Yuichiro Katsura, Ryu Matsumoto, Yuji Yada, Ken Nakakura | 2017-11-14 |
| 9818598 | Substrate cleaning method and recording medium | Meitoku Aibara, Yuki Yoshida, Hisashi Kawano, Masami Yamashita, Itaru Kanno +1 more | 2017-11-14 |
| 9540535 | Composition for forming liquid immersion upper layer film, and polymer | Kiyoshi Tanaka, Kazunori Kusabiraki, Takahiro Hayama | 2017-01-10 |