Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9837286 | Systems and methods for selectively etching tungsten in a downstream reactor | Dengliang Yang, Helen Zhu, George Matamis, Brad Jacobs, Joon Hong Park | 2017-12-05 |
| 9659783 | High aspect ratio etch with combination mask | Sirish Reddy, Kaushik Chattopadhyay, Thomas W. Mountsier, Aaron Eppler, Thorsten Lill +2 more | 2017-05-23 |
| 9601319 | Systems and methods for eliminating flourine residue in a substrate processing chamber using a plasma-based process | Andrew Stratton Bravo, Amit Pharkya | 2017-03-21 |