Issued Patents 2017
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9607904 | Atomic layer deposition of HfAlC as a metal gate workfunction material in MOS devices | Albert S. Lee, Paul R. Besser, Kisik Choi, Hoon Kim, Salil Mujumdar | 2017-03-28 |