Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9670579 | Method for depositing a chlorine-free conformal SiN film | Dennis M. Hausmann, Jon Henri, Easwar Srinivasan | 2017-06-06 |
| 9570274 | Plasma activated conformal dielectric film deposition | Shankar Swaminathan, Jon Henri, Dennis M. Hausmann, Pramod Subramonium, Mandyam Sriram +3 more | 2017-02-14 |