Issued Patents 2017
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9837553 | Vertical field effect transistor | Xusheng Wu, John H. Zhang | 2017-12-05 |
| 9812365 | Methods of cutting gate structures on transistor devices | John H. Zhang, Xusheng Wu, Ruilong Xie, Stan Tsai | 2017-11-07 |
| 9761491 | Self-aligned deep contact for vertical FET | Xusheng Wu, John H. Zhang | 2017-09-12 |
| 9754837 | Controlling within-die uniformity using doped polishing material | Jinping Liu, Huang Liu, Taifong Chao | 2017-09-05 |
| 9711447 | Self-aligned lithographic patterning with variable spacings | Jiehui Shu, Qiang Fang, Daniel W. Fisher, Jinping Liu, Haifeng Sheng +1 more | 2017-07-18 |
| 9698018 | Introducing self-aligned dopants in semiconductor fins | Xintuo Dai, Jinping Liu | 2017-07-04 |
| 9679985 | Devices and methods of improving device performance through gate cut last process | Xusheng Wu | 2017-06-13 |
| 9595493 | Reducing liner corrosion during metallization of semiconductor devices | Zhiguo Sun, Qiang Fang, Huang Liu, Jiehui Shu, Jin Ping Liu | 2017-03-14 |
| 9589807 | Method for eliminating interlayer dielectric dishing and controlling gate height uniformity | Jinping Liu, Huang Liu, Yuanfang Lu | 2017-03-07 |