Issued Patents 2017
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9638999 | Dual-layer light-sensitive developer-soluble bottom anti-reflective coatings for 193-nm lithography | Jim D. Meador, Ramil Marcelo L. Mercado | 2017-05-02 |
| 9640396 | Spin-on spacer materials for double- and triple-patterning lithography | Qin Lin, Rama Puligadda, James Claypool, Brian Smith | 2017-05-02 |