GN

Gerrit Johannes Nijmeijer

AB Asml Netherlands B.V.: 2 patents #117 of 568Top 25%
AN Asml Holding N.V.: 1 patents #19 of 50Top 40%
📍 Larchmont, NY: #6 of 31 inventorsTop 20%
🗺 New York: #2,508 of 12,278 inventorsTop 25%
Overall (2017): #151,988 of 506,227Top 35%
2
Patents 2017

Issued Patents 2017

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
9740106 Substrate placement in immersion lithography Christiaan Alexander Hoogendam, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck 2017-08-22
9551939 Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method Simon Gijsbert Josephus Mathijssen, Arie Jeffrey Den Boef, Stanley Drazkiewicz, Justin Kreuzer 2017-01-24