Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9848461 | Methods and apparatus for thermally treating a substrate | — | 2017-12-19 |
| D797067 | Target profile for a physical vapor deposition chamber target | Fuhong Zhang, William Johanson, Yu Liu, Adolph Miller Allen, Brij Datta | 2017-09-12 |
| 9689070 | Deposition ring and electrostatic chuck for physical vapor deposition chamber | Muhammad M. Rasheed, Rongjun Wang | 2017-06-27 |
| 9605341 | Physical vapor deposition RF plasma shield deposit control | — | 2017-03-28 |
| 9580795 | Sputter source for use in a semiconductor process chamber | Martin Lee Riker | 2017-02-28 |
| 9564348 | Shutter blade and robot blade with CTE compensation | Ilya Lavitsky | 2017-02-07 |
| 9534286 | PVD target for self-centering process shield | Goichi Yoshidome, Ryan Edwin Hanson, Donny Young, Muhammad M. Rasheed | 2017-01-03 |