Issued Patents 2017
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9831075 | Source magnet for improved resputtering uniformity in direct current (DC) physical vapor deposition (PVD) processes | Goichi Yoshidome | 2017-11-28 |
| D801942 | Target profile for a physical vapor deposition chamber target | Martin Lee Riker, Yu Liu | 2017-11-07 |
| D797067 | Target profile for a physical vapor deposition chamber target | William Johanson, Yu Liu, Adolph Miller Allen, Brij Datta, Keith A. Miller | 2017-09-12 |