Issued Patents 2016
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9502537 | Method of selectively removing a region formed of silicon oxide and plasma processing apparatus | Akinori Kitamura, Eiji Suzuki | 2016-11-22 |
| 9412607 | Plasma etching method | Tomiko Kamada, Akinori Kitamura, Yutaka Osada, Yuji Otsuka, Masayuki Kohno +2 more | 2016-08-09 |
| 9373520 | Multilayer film etching method and plasma processing apparatus | Shota Yoshimura, Eiji Suzuki, Tomiko Kamada | 2016-06-21 |
| 9305795 | Plasma processing method | Tomiko Kamada | 2016-04-05 |