Issued Patents 2016
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9525040 | Method of fabricating hybrid impact-ionization semiconductor device | Lee-Wee Teo, Harry-Hak-Lay Chuang | 2016-12-20 |
| 9515069 | Semiconductor die | Harry-Hak-Lay Chuang | 2016-12-06 |
| 9508721 | Metal gate structure of a CMOS semiconductor device | Bao-Ru Young, Harry-Hak-Lay Chuang | 2016-11-29 |
| 9478633 | Method and apparatus of forming ESD protection device | Lee-Wee Teo, Harry-Hak-Lay Chuang | 2016-10-25 |
| 9472636 | Cost-effective gate replacement process | Bao-Ru Young, Harry-Hak-Lay Chuang, Jyun-Ming Lin, Wei-Cheng Wu | 2016-10-18 |
| 9466714 | Vertical tunneling field-effect transistor cell with coaxially arranged gate contacts and drain contacts | Harry-Hak-Lay Chuang, Cheng-Cheng Kuo | 2016-10-11 |
| 9431500 | Integrated circuit device having defined gate spacing and method of designing and fabricating thereof | Harry-Hak-Lay Chuang, Po-Nien Chen, Bao-Ru Young | 2016-08-30 |
| 9412841 | Method of fabricating a transistor using contact etch stop layers | Lee-Wee Teo, Bao-Ru Young, Harry-Hak-Lay Chuang | 2016-08-09 |
| 9406669 | Method and structure for vertical tunneling field effect transistor and planar devices | Harry-Hak-Lay Chuang, Yi-Ren Chen, Chi-Wen Liu, Chao-Hsiung Wang | 2016-08-02 |
| 9362128 | Methods for fabricating integrated circuits and components thereof | Yiang Aun Nga | 2016-06-07 |
| 9337194 | Semiconductor device and method of forming the same | Harry-Hak-Lay Chuang | 2016-05-10 |
| 9324622 | Semiconductor device and method of forming the same | Harry-Hak-Lay Chuang, Sin-Hua Wu, Chung-Hau Fei, Bao-Ru Young | 2016-04-26 |
| 9299696 | Semiconductor structure with suppressed STI dishing effect at resistor region | Harry-Hak-Lay Chuang, Lee-Wee Teo, Bao-Ru Young | 2016-03-29 |
| 9257347 | System and method for a field-effect transistor with a raised drain structure | Hak-Lay Chuang | 2016-02-09 |
| 9252142 | Integrated circuits including a resistance element and gate-last techniques for forming the integrated circuits | Yiang Aun Nga | 2016-02-02 |
| 9231084 | Method of forming laterally diffused metal oxide semiconductor transistor with partially unsilicided source/drain | Harry-Hak-Lay Chuang, Lee-Wee Teo | 2016-01-05 |