Issued Patents 2016
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date | Approx Value ⓘ |
|---|---|---|---|---|
| 9462694 | Spacer layer for embedding semiconductor die | Junrong Yan, Weili Wang, Pradeep Rai, Xin Lu, Jianbin Gu +1 more | 2016-10-04 | |
| 9453801 | Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems | Daimian Wang, Yanwei Liu, Alan Aindow | 2016-09-27 | |
| 9348214 | Spectral purity filter and light monitor for an EUV reticle inspection system | Daimian Wang, Frank Chilese, David Alles | 2016-05-24 | |
| 9330885 | Method of stack patterning using a ion etching | Michael Feldbaum, Justin Jia-Jen Hwu, David S. Kuo, Gennady Gauzner | 2016-05-03 | $5,277,000 |
| 9284649 | Method of patterning a stack | Michael Feldbaum, Justin Jia-Jen Hwu, David S. Kuo, Gennady Gauzner, Kim Y. Lee | 2016-03-15 | $6,235,000 |