DW

Daimian Wang

KL Kla-Tencor: 2 patents #58 of 327Top 20%
Overall (2016): #148,243 of 481,213Top 35%
2
Patents 2016

Issued Patents 2016

Patent #TitleCo-InventorsDate
9453801 Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems Li-Ping Wang, Yanwei Liu, Alan Aindow 2016-09-27
9348214 Spectral purity filter and light monitor for an EUV reticle inspection system Li-Ping Wang, Frank Chilese, David Alles 2016-05-24