Issued Patents 2016
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9507259 | Photoresist composition | Mingqi Li, Emad Aqad, Ching-Lung Chen, Shintaro Yamada, Cheng-Bai Xu +1 more | 2016-11-29 |
| 9488910 | Sulfonyl photoacid generators and photoresists comprising same | Cheng-Bai Xu | 2016-11-08 |
| 9475763 | Photoresist comprising nitrogen-containing compound | Chunyi Wu, Gerhard Pohlers, Gregory P. Prokopowicz, Cheng-Bai Xu | 2016-10-25 |
| 9448486 | Photoresist pattern trimming compositions and methods | Seung Hyun Lee, Kevin Rowell, Gerhard Pohlers, Cheng-Bai Xu, Wenyan Yin +2 more | 2016-09-20 |
| 9436082 | Compositions comprising base-reactive component and processes for photolithography | Deyan Wang, Shintaro Yamada, Mingqi Li, Joon Seok Oh, Chunyi Wu +2 more | 2016-09-06 |
| 9348220 | Photoacid generators and photoresists comprising same | Emad Aqad, Mingqi Li, Cheng-Bai Xu | 2016-05-24 |
| 9296879 | Hardmask | Shintaro Yamada, Deyan Wang, Sabrina Wong, Cheng-Bai Xu | 2016-03-29 |
| 9256125 | Acid generators and photoresists comprising same | Emad Aqad, Irvinder Kaur, Cheng-Bai Xu | 2016-02-09 |
| 9255079 | Photoacid generators and photoresists comprising same | Mingqi Li, Emad Aqad, Joseph Mattia, Cheng-Bai Xu, George G. Barclay | 2016-02-09 |
| 9244352 | Coating compositions for use with an overcoated photoresist | Anthony Zampini, Gerald B. Wayton, Vipul Jain, Suzanne M. Coley, Owendi Ongayi | 2016-01-26 |