Issued Patents 2016
Showing 1–4 of 4 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9507260 | Compositions and processes for photolithography | Deyan Wang, Cheng-Bai Xu, George G. Barclay | 2016-11-29 |
| 9475763 | Photoresist comprising nitrogen-containing compound | Cong Liu, Gerhard Pohlers, Gregory P. Prokopowicz, Cheng-Bai Xu | 2016-10-25 |
| 9436082 | Compositions comprising base-reactive component and processes for photolithography | Deyan Wang, Shintaro Yamada, Cong Liu, Mingqi Li, Joon Seok Oh +2 more | 2016-09-06 |
| 9274427 | Compositions and processes for photolithography | Deyan Wang | 2016-03-01 |