Issued Patents 2016
Showing 1–5 of 5 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9484188 | Individual beam pattern placement verification in multiple beam lithography | — | 2016-11-01 |
| 9395635 | Position determination in a lithography system using a substrate having a partially reflective position mark | Guido De Boer | 2016-07-19 |
| 9395636 | Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer | Guido De Boer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg | 2016-07-19 |
| 9383662 | Lithography system for processing at least a part of a target | Guido De Boer, Godefridus Cornelius Antonius Couweleers, Laurens Plandsoen, Cor Verburg | 2016-07-05 |
| 9261800 | Alignment of an interferometer module for use in an exposure tool | Guido De Boer, Thomas Adriaan Ooms, Godefridus Cornelius Antonius Couweleers | 2016-02-16 |