Issued Patents 2016
Showing 1–2 of 2 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9453801 | Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems | Li-Ping Wang, Daimian Wang, Alan Aindow | 2016-09-27 |
| 9335206 | Wave front aberration metrology of optics of EUV mask inspection system | Qiang Zhang, Abdurrahman Sezginer | 2016-05-10 |