Issued Patents 2016
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9494535 | Scatterometry-based imaging and critical dimension metrology | John J. Hench, Michael S. Bakeman | 2016-11-15 |
| 9478019 | Reticle inspection using near-field recovery | Rui-fang Shi | 2016-10-25 |
| 9430824 | Machine learning method and apparatus for inspecting reticles | Gang Pan, Bing Li | 2016-08-30 |
| 9335206 | Wave front aberration metrology of optics of EUV mask inspection system | Qiang Zhang, Yanwei Liu | 2016-05-10 |
| 9311700 | Model-based registration and critical dimension metrology | Mohammad Mehdi Daneshpanah | 2016-04-12 |
| 9292627 | System and method for modifying a data set of a photomask | Dipankar Pramanik, Michiel Victor Paul Kruger, Roy Prasad | 2016-03-22 |