Issued Patents 2016
Showing 1–8 of 8 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9500945 | Pattern classification based proximity corrections for reticle fabrication | Guoxiang Ning, Chin Teong Lim, Christian Buergel | 2016-11-22 |
| 9384318 | Mask error compensation by optical modeling calibration | Guoxiang Ning, Chin Teong Lim | 2016-07-05 |
| 9368453 | Overlay mark dependent dummy fill to mitigate gate height variation | Guoxiang Ning, Chan Seob Cho, Jung-Yu Hsieh, Hui Peng Koh | 2016-06-14 |
| 9341961 | Cross technology reticle (CTR) or multi-layer reticle (MLR) CDU, registration, and overlay techniques | Guo Xiang Ning, Arthur Hotzel, Soon Yoeng Tan | 2016-05-17 |
| 9323882 | Metrology pattern layout and method of use thereof | Guoxiang Ning, Guido Ueberreiter, Lloyd C. Litt | 2016-04-26 |
| 9252061 | Overlay mark dependent dummy fill to mitigate gate height variation | Guoxiang Ning, Chan Seob Cho, Jung-Yu Hsieh, Hui Peng Koh | 2016-02-02 |
| 9250538 | Efficient optical proximity correction repair flow method and apparatus | Guoxiang Ning, Christopher A. Spence, Chin Teong Lim | 2016-02-02 |
| 9236301 | Customized alleviation of stresses generated by through-substrate via(S) | Guoxiang Ning, Xiang Hu, Sarasvathi Thangaraju | 2016-01-12 |