| 9477149 |
Photoresist composition, compound, and production method thereof |
Hayato Namai, Takanori Kawakami |
2016-10-25 |
| 9459532 |
Radiation-sensitive resin composition, polymer and compound |
Shin Nakamura |
2016-10-04 |
| 9390941 |
Sample processing apparatus, sample processing system, and method for processing sample |
Seiichi Watanabe, Yutaka Kozuma, Tooru Aramaki, Naoki Yasui, Hiroaki Takikawa |
2016-07-12 |
| 9329474 |
Photoresist composition and resist pattern-forming method |
Kazuki Kasahara |
2016-05-03 |
| 9323146 |
Photoresist composition, resist pattern-forming method, compound, acid generating agent, and photodegradable base |
Hayato Namai, Kazuo Nakahara |
2016-04-26 |