Issued Patents 2016
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9459537 | System and method to ensure source and image stability | Yu Cao, Venugopal Vellanki, Johannes Catharinus Hubertus Mulkens | 2016-10-04 |
| 9390206 | Methods and systems for lithography process window simulation | Yu Cao, Hanying Feng | 2016-07-12 |
| 9378309 | Pattern-independent and hybrid matching/tuning including light manipulation by projection optics | Hanying Feng, Yu Cao | 2016-06-28 |
| 9372957 | Three-dimensional mask model for photolithography simulation | Peng Liu, Yu Cao, Luoqi Chen | 2016-06-21 |
| 9360766 | Method and system for lithography process-window-maximixing optical proximity correction | Yu Cao, Hanying Feng | 2016-06-07 |
| 9262579 | Integration of lithography apparatus and mask optimization process with multiple patterning process | Luoqi Chen, Hong Chen | 2016-02-16 |